Copper Gleam™ HS-200 Electrolytic Copper from Dupont Dow Rhom Hass Company

2022-03-07 10:08

The Copper Gleam™ HS-200 bath is a full bright acid copper plating process specifically formulated for use in conveyorized plating equipment with insoluble anode. Formulated for high current density plating, the process is capable of producing uniform, bright deposits of high ductility and tensile strength in accelerated plating times.
 

Key Benefits:

  • High Throwing power at accelerate plating rate
  • Bright uniform deposits
  • Exceptional physical properties
  • Complete analytical control
     

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垂直连续电镀(VCP)高TP值酸性镀铜光泽剂用电镀中间体:www.tongtai-technology.com/news/170.html
 

PCB/FPC用高TP值VCP酸性镀铜光亮剂中间体产品介绍:www.tongtai-technology.com/news/30.html
 

2021年度填孔镀铜——印刷线路板(PCB,FPC)酸性填孔镀铜中间体:www.tongtai-technology.com/news/283.html

 

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